New Generation TMO photoinitiator wins Jung Technology Innovation Award

Zhong Xiaofeng
Zhong Xiaofeng, Deputy General Manager of PhiChem Materials’ Photosensitive Materials Division

PhiChem Corporation was awarded the prestigious Jung Technology Innovation Award for its innovation in developing “TMO: The New Generation Photoinitiator Material”. The award not only recognizes the outstanding contributions in technological innovation made by PhiChem, but also recognizes its profound strength in product research and development.

The Jung Technology Innovation Award aims to recognize innovative products and technologies that have made remarkable impact in the industry. The influence of this award continues to expand, and it is one of China’s premier international and professional industrial technology innovation awards.

The new generation of photoinitiator TMO is a product independently developed by PhiChem Materials with independent intellectual property rights. The patent (patent number: WO 2020/113585 A1) has been issued in multiple countries around the globe. The traditional photoinitiator TPO was listed as a substance of very high concern (SVHC) by the European Union in June 2023 due to its reproductive toxicity, which greatly restricts the sale of TPO-containing coatings formulations in the EU and other regions. The new generation of photoinitiator TMO, an excellent alternative to TPO, can effectively solve this industry problem.

PhiChem Materials, as the lead registrant, has obtained EU REACH registration certification for TMO products. It is also one of the few domestic companies that has independently developed new chemical substances and obtained EU registration certification. At present, TMO products have achieved industrial mass production at the Anqing production base and have been introduced into multiple product formulations.

This award is an affirmation of PhiChem Materials’ technological innovation, and demonstrates the commitment the company has made towards developing safe, sustainable materials for critical applications around the globe.